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In the public domainClimate TechAssigned to Matsushita Electric Industrial Co., Ltd.

All solid-state thin-film cell and application thereof

All solid-state thin-film cells using semiconductor sputtering and vapor deposition patterns now expired for new deployments.

What it is

The technology fabricates an all solid-state thin-film solar cell by depositing and patterning thin layers using semiconductor-style sputtering and vapor deposition methods. Its significance is that it leverages standard semiconductor process tooling and patterning steps, enabling high-throughput multilayer deposition rather than slower specialty fabrication. Previously, producing patterned all-solid-state thin-film cells with these methods required licensing from the patent holder.

What you could build

Launch patterned all-solid-state thin-film solar modules for rooftops, EV charging canopies, and portable off-grid power.

Patent number
20040185336A1
Expiration
Assignee
Matsushita Electric Industrial Co., Ltd.
Inventors
Takeshi T. Kato, Takashi Uehara, Toru Kato, Takeshi Hishinuma

Original abstract

An all solid-state thin-film cell is fabricated as introducing a sputtering method, a vapor deposition method and the like, which are used in the semiconductor production process, and a patterning method.

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